Non-ionic photo-acid generators for applications in two-photon lithography
Lorenz Steidl, Shalin J. Jhaveri, Ramakrishnan Ayothi, Jing Sha, Jesse D. McMullen, Sin Yee Cindy Ng, Warren R. Zipfel, Rudolf Zentel* and Christopher K. Ober*
J. Mater. Chem. 2009, 19, 505